VLSI

To know about the different IC fabrication techniques, click on the link below. TAKE A LOOK : IC FABRICATION TECHNIQUES Diffusion of Dopant Impurities The process of junction formation, that is transition from p to n type or vice versa, is typically accomplished by the process of diffusing the appropriate dopant impurities in a high […]

To know more about lithographic process and it’s basic types, click on the link below. TAKE A LOOK : IC FABRICATION TECHNIQUES TAKE A LOOK : PHOTOLITHOGRAPHY Electron-beam lithography provides better resolution then photolithography. This is possible because of small wavelength of the 10-50 KeV electrons. The resolution of electron-beam lithography system is not limited

To know more about lithographic process and it’s basic types, click on the link below. TAKE A LOOK : IC FABRICATION TECHNIQUES TAKE A LOOK : PHOTOLITHOGRAPHY The photolithography has its resolution limited by diffraction effects. To improve the resolution, therefore, the diffraction effects are reduced by reducing the wavelength. However, if the wavelength is

To know more about lithographic process and it’s basic types, click on the link below. TAKE A LOOK : IC FABRICATION TECHNIQUES TAKE A LOOK : PHOTOLITHOGRAPHY Ion-Beam Lithography Ion-beam lithography, when used to expose resist, provides higher resolution than that possible with an electron-beam because of less scattering. Also, resists are more sensitive to

To know more about the basics, click on the link below. TAKE A LOOK : IC FABRICATION TECHNIQUES When a sample of crystalline silicon is covered with silicon dioxide, the oxide-layer acts as a barrier to the diffusion of impurities, so that impurities separated from the surface of the silicon by a layer of oxide

To know the basics click on the following links TAKE A LOOK : IC FABRICATION TECHNIQUES TAKE A LOOK : SILICON SUBSTRATE PREPARATION TAKE A LOOK : CHEMICAL VAPOUR DEPOSITION (CVD) Utility of Thermal Oxidation The function of a layer of silicon dioxide (SiO2) on a chip is multipurpose. SiO2 plays an important role in

Chemical Vapor Deposition Process In this article, Chemical Vapor Deposition process is explained in detail. The epitaxial deposition, uses, and also the epitaxial growth of silicon is explained in detail. Doping and Autodoping, Epitaxial Reactors, Epitaxial Growth Process, their advantages and disadvantages are also explained. The different types of CVD reactors and their advantages and

Silicon Substrate Preparation Process In this article the details on how a silicon substrate is prepared is given.We have structured the article into 5 sections as give below for easy and effective reading. 1. The silicon crystal growth 2. Electronic grade silicon production 3. Czochralski Crystal Growth Process 4. Wafer preparation 5. Wafer processing If

IC Fabrication Techniques In this article, the different processing techniques that are needed for IC , transistor and diode fabrication are listed. A small procedure of the fabrication process is also explained. In a monolithic IC, all the circuit components are fabricated into or top of a block of silicon which is referred to as

Introduction In the earlier 60’s it was discrete logic used by electronic industry. The digital system would look like noodle like maze of wiring between components. Once it is built it will be difficult to do rework on it. Sometimes the designers would forget what they have designed for! Manufacturing such systems was very difficult

Cadence Design Framework II All the tools from cadence for the VLSI design process use the same unique database called Design Framework II (DFII). It is a binary database that stores the data as objects. In the world of Electronic Design Automation (EDA), there are different types of objects and each representing a distinct concept.